Next-Generation Bath Monitoring for Semiconductor Manufacturing

Maintaining tight control of critical bath chemistries is essential for achieving consistent process performance, product quality, and manufacturing yield in semiconductor production. However, some key bath components remain difficult to measure reliably, creating challenges for effective process monitoring and real-time process control. While wet chemistry methods and Near Infrared (NIR) spectroscopy have long supported semiconductor manufacturing, companies continue to evaluate new analytical technologies that can provide faster, more comprehensive insight into critical process conditions. 

Join Brian Benner, Principal Scientist at Micron, and Elena Hagemann, Product Manager Process Spectroscopy at Metrohm USA, as they share their perspective on next-generation bath monitoring and the evolving role of Process Analytical Technology (PAT) in semiconductor manufacturing.  Learn how industry leaders approach challenges with current NIR monitoring strategies for critical process chemistries and explore why Raman spectroscopy is emerging as a next-generation solution for real-time process monitoring and manufacturing consistency. 

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