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Copper plating
Reliable and precise analyzers are needed for an efficient and effective copper plating process
Among other reasons, copper plating is used to ensure good conductivity or provide corrosion resistance. Monitoring the plating bath composition and its impurities is key for uniform and reliable copper deposition.
Rely on Metrohm for top-quality analytical instruments, know-how, and first-class, on-site service to support your copper plating process.
Take advantage of our presence in over 80 countries with more than 50 subsidiaries and 30 exclusive distributors.
Discover our latest solutions for your analysis
Automated CVS method development and optimization of multicomponent plating baths
Download this White Paper to learn more about how to optimize CVS methods for the analysis of electroplating copper baths.
Products
Metrohm helps manufacturers maintain high-quality coatings, extend bath lifetimes, and achieve consistent, reproducible results in copper plating processes with reliable laboratory and process solutions.
Professional CVS
Flexible benchtop analyzers for Cyclic Voltammetric Stripping.
2060 Platform
The robust and reliable modular analyzer platform for ultimate flexibility in customized process monitoring.
OMNIS titrators
All-in-one potentiometric autotitrator platform: faster results, safer handling of chemicals, and maximum modularity for easier adaptability to your requirements.
- AN-V-242brightRC – Advanced brightener analysis with a response curve
brightRC enables reliable CVS (or CPVS) brightener quantification without repeated standard additions, especially for additive systems with nonlinear signal behavior. By using external response curve (RC) calibration and flexible regression, it avoids systematic errors inherent to linear standard addition methods and significantly reduces analysis time. This makes brightRC ideal for high throughput routine control in stable copper plating baths.
- WP-097Why switch to OMNIS Client/Server (C/S)?
OMNIS Client/Server boosts business performance with scalable server management, cutting costs by reducing hardware, energy use, and maintenance across locations.
- AN-PAN-1067Online analysis of organic additives in copper plating process
Monitoring organic additives in copper plating baths is crucial. The 2060 CVS Process Analyzer optimizes copper electroplating by providing precise bath control.
- AN-H-043Determination of copper by iodometric titration
Determination of copper, principally in copper mining and refining solutions. The method may also be used fordetermination of purity of copper metal. Optimal results are obtained when aliquots containing copper in the rangeapproximately 3 - 6 mmol Cu are titrated.
- AB-121Determination of nitrate with the ion-selective electrode
It has been known for years that consuming too much nitrates from foodstuffs can result in cyanosis, particularly for small children and susceptible adults. According to the WHO standard, the hazard level lies at a mass concentration c(NO3-) ≥ 50 mg/L. However, more recent studies have shown that when nitrate concentrations in the human body are too high, they can (via nitrite) result in the formation of carcinogenic and even more hazardous nitrosamines.Known photometric methods for the determination of the nitrate anion are time-consuming and prone to a wide range of interferences. With nitrate analysis continually increasing in importance, the demand for a selective, rapid, and relatively accurate method has also increased. Such a method is described in this Application Bulletin. The Appendix contains a cselection of application examples where nitrate concentrations have been determined in water samples, soil extracts, fertilizers, vegetables, and beverages.
